Getting My Noohapou To Work
Getting My Noohapou To Work
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distant spots: Static models are generally located remotely, raising Price tag and reducing overall technique effectiveness.
30% of its peak ability usage, offering our consumers sizeable reduction in operating expenses and elevated dependability.
Together with the POU3500, you can reach unprecedented results in etch general performance, chamber uptime, lessened expense of possession and fab House utilization – all while bettering your method trustworthiness.
initially Started in 1985, our enterprise has developed right into a regarded chief in furnishing temperature Manage techniques to the global semiconductor market.
LAUDA-Noah will, for just a purchaser's retrofit evaluation, watch and modify its fluid temperature control profiles to match an present TCUs' if you want to ensure a clean system integration via DAQ.
The precision of your POU 3300 allows for unbiased Charge of the method fluid temperature towards the wafer chuck inside of +/- 0.one °C of set position, and also the quickly response time of your method here allows for max wafer-to-wafer repeatability throughout the etch procedure.
The accuracy of the POU 3500 allows for independent control of the process fluid temperature for the wafer chuck in just +/- 0.one °C of established issue, as well as rapid reaction time of your method allows for optimum wafer-to-wafer repeatability throughout the etch course of action.
With our device strategically mounted close to 6 ft with the chamber, we achieve a much more precise studying with the chuck temperature. This technique assures reliable temperature all over the manufacturing good deal, leading to enhanced wafer-to-wafer CD uniformity.
The data pertains to a 300mm chamber temperature profile for the duration of a higher part ratio Etch procedure, working at really substantial RF ability circumstances (~three.8kW). The powerful components of this data set are:
Dynamic Temperature Management, as applied in units such as LAUDA-Noah POU, is undoubtedly an approach that senses the temperature of the procedure fluid getting back from the process chamber’s wafer chuck (ESC) and dynamically adjusts the temperature in the provided method fluid determined by this authentic-time feed-back.
The TEs' can change straight from heating to cooling, or visa-versa. they could switch on & off while in the heating or cooling method and can enhance or reduce the level of heating or cooling without the need of switching whatsoever.
a lot more than at any time, shrinking unit geometries, demanding new processes and also a hugely aggressive ecosystem need temperature Management units that Blend quickly and accurate temperature control with the emphasis on lessened running expenses and enhanced trustworthiness.
the fact is real Dynamic Temperature Regulate can only be obtained when all five (5) of the next technique layout and installation requirements are satisfied:
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We realize that fantastic items are sometimes the results of fantastic client feed-back and the appliance of innovative know-how. We try to create value for our customers through a approach that lets the customer impact our plans, goals, product developments and organization techniques.
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